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關(guān)注：1
2013-05-23 12:21
求翻譯：Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.是什么意思？ 待解決
 懸賞分：1
- 離問題結(jié)束還有
Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.
問題補(bǔ)充： |
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2013-05-23 12:21:38
的zn1 xMgxO薄膜沉積過程中使用的生長參數(shù)，如前體劑量，吹掃時(shí)間和ALD的周期的數(shù)量的MgO和ZnO進(jìn)程。
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2013-05-23 12:23:18
正在翻譯，請等待...
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2013-05-23 12:24:58
成長參量例如前體藥量、清除時(shí)間和MgO和ZnO過程的ALD周期的數(shù)量用于Zn1 xMgxO影片證言過程。
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2013-05-23 12:26:38
生長參數(shù)，如前體的劑量，清除倍，和在 Zn1xMgxO 薄膜沉積過程中使用了限期周期的氧化鎂、 氧化鋅的進(jìn)程數(shù)。
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2013-05-23 12:28:18
Growth parameters such as precursor doses, purge times, and the number of ALD cycles of the MgO and ZnO processes were used in the Zn1xMgxO film deposition process.
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