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關注：1
2013-05-23 12:21
求翻譯：Referring to FIG. 6I, a photosensitive resin 143 is formed on the second protective layer 140. The photosensitive resin 143 is patterned by a photolithography process, and the second protective layer 140 is etched using the patterned photosensitive resin.是什么意思？ 待解決
 懸賞分：1
- 離問題結束還有
Referring to FIG. 6I, a photosensitive resin 143 is formed on the second protective layer 140. The photosensitive resin 143 is patterned by a photolithography process, and the second protective layer 140 is etched using the patterned photosensitive resin.
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